Abstract
The electrons scattered by the defects in the channel can be described by the time-dependent Schrodinger equation. An analytical and physical model of the time evolution of the source–drain current in a transistor at a given defect density has been proposed. It clearly shows that the source–drain current is composed of direct-current and a lot of alternating-current components. And thus the source–drain current will be sensitive to the defect density in the channel. Further, an analytical and physical relation between the phase shift of alternating-current components and the defect density in the channel is derived. Phase shift obtained from time-evolution experimental data of the source–drain current in aging process of nanoscale memory devices agrees well with the theoretical prediction.
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