Abstract
Temperature dependences of the hole concentration and Hall mobility in Mg-doped GaN and Al0.08Ga0.92N grown by metalorganic vapor phase epitaxy were measured by the van der Pauw method over a wide temperature range from 100 to 500 K. Assuming that the effective mass of holes in Al0.08Ga0.92N is equal to that of GaN, the activation energy of the Mg shallow acceptor in Al0.08Ga0.92N is estimated to be about 35 meV deeper than that in GaN.
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