Abstract
This paper follows previous demonstrations of demagnification by bias in ultra-high resolution proximity x-ray lithography. The demagnification, ×1-×6, is achieved without lenses or mirrors. Two-dimensional proximity corrections, applied to rectangular mask shapes, are simulated. A V-shaped inrigger, cut into the mask, is particularly effective. When a typical range of broadband illumination wavelengths is used, several beneficial effects are observed when the gap is held at the `critical condition'. Maintaining fine resolution, oscillations - due to Fresnel diffraction parallel to the longer dimension of a rectangle - are virtually eliminated, and the image intensity is made uniform by the elimination of bright spots near the ends of a rectangle.
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