Abstract
AbstractThe effects of a hollow cathode discharge and secondary electron emission from a radio‐frequency‐biased electrode on the growing rate of diamond‐like carbon films were studied. The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm·min−1 was attained at a voltage of −700 V with radio‐frequency plasma using CH4 gas. Because of its non‐uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 µm, was obtained with the best arrangement.
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