Abstract
Pastes and inks to contact silicon solar cell emitters have been further developed since decades and considerable improvements have been achieved. According to different R&D roadmaps for silicon solar cells emitter sheet resistances will further increase and the surface dopant concentration will decrease as narrower contact lines support such a development. This leads to new requirements of contact pastes. In this paper an improved contact ink based on silver will be presented which is able to contact phosphorous emitters with low surface dopant concentrations of ND = 8á1018 cm-3.
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