Abstract
Nanostructured Al 2O 3–TiO 2 composite films were prepared on glass substrates by metalorganic chemical vapor deposition (MOCVD) using aluminum acetylacetonate and titanium tetraisopropoxide precursors. Oxygen and argon were used as the reactive and carrier gases, respectively. Deposition temperature ( T dep) was varied from 723 to 873 K and total pressure was kept constant at 133–266 Pa. The formation of composite films was achieved by mixing the precursor vapors, which were obtained by heating the aluminum and titanium precursors at 403 and 323–353 K, respectively. The films were characterized by XRD, SEM, EPMA and TEM. The crystalline structure and the surface morphology of the nanostructured Al 2O 3–TiO 2 composite films were strongly dependent on the precursor and deposition temperatures.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
