Abstract
Sacrificial anodic oxidation is used to thin silicon wafer bonding substrates. Chemical solutions, sensitive to the periodic strain field present in the upper ultra-thin silicon layer, are employed for selective etching. Subsequent scanning tunnel microscopy observations reveal a square array of trenches corresponding to the buried screw dislocation network initially formed at the bonding interface. The influence of the initial thickness and the annealing of the ultra-thin film on roughness and trench depth of the nanopatterned substrates are examined. Germanium growth experiments are performed in order to show the self-organization character of resulting structured surfaces.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
