Preparation and characterization of NiO/PSi as self-cleaning surface

Abstract

Water-resistant surfaces are very important to many modern technology applications. So the progresses of hydrophobic & hydrophilic surfaces for self-cleaning applications has received widespread attention over the past years. In this paper, investigating in self-cleaning surfaces technique are presented. Nickel oxide Nanoparticles (NiONPs) were manufactured at different concentrations on the porous silicon (PSi) surface by immersion plating process, which filled with square-pores like structure which affected in classification of hydrophilic and hydrophobic surfaces. This green method to prepare Nickel oxide Nanoparticles/porous silicon (NiONPs/PSi) structures was interesting because it is effective for self-cleaning applications and is low cost and environmentally friendly. NiONPs/PSi structures characterized by the use of X-Ray Diffraction, electron microscopy scanning, Fourier-transform infrared (FTIR) analysis, Ultraviolet–visible (UV) spectroscopy, and contact angle analysis. The results show that hydrophilicity & hydrophobicity of these structures strongly depend on the surface morphology of porous silicon and the resulting the shape and distribution of NiO nanoparticles. From all results, it was found that the optimum contact angle is 118° at a NiO concentration of 10-2 M for the NiONPs/PSi structure which has hydrophobic properties as it can be used as a self-cleaning surface.