Abstract
To prevent Co diffusion from cemented carbides at high working temperatures, we fabricated CrTaN coatings by reactive direct current magnetron co-sputtering onto 6wt.% cobalt cemented carbide substrates, to form diffusion barrier layers. The nitrogen flow ratio, N2/(Ar+N2), during the sputtering process was set at 0.4. The deposition rates of CrTaN coatings varied from 23 to 27nm/min. The CrTaN coatings crystallized into a columnar structure, without heating the substrates during the sputtering process and exhibited surface hardness and Young's modulus values of 16–27 and 211–383GPa, respectively. The CrTaN coatings were annealed at 500 and 600°C for 4h in air to evaluate the oxidation resistance and diffusion barrier performance. We also investigated oxidation resistance of the CrTaN coatings under a 50ppm O2–N2 atmosphere, to assess the fabricated layers effectiveness as a protective coating for glass molding dies.
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