Abstract
Rutherford backscattering and Auger-electron spectroscopy measurements reveal that low-energy (500 eV) neutral Ne° beam bombardment on a SiO2 surface does not cause preferential sputtering of oxygen, whereas Ne+ ion beam bombardment of the same energy causes significant preferential sputtering. The results strongly suggest that the ionic charge plays the dominant role in the preferential sputtering of oxygen from SiO2. In addition, neutral-beam bombardment modifies the SiO2 surface to be resistant to reduction by the subsequent ion beam bombardment. It is argued that neutral-beam bombardment produces densified SiO2.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
