Abstract
ABSTRACTTo better understand the response of oxygen vacancy concentration to applied potential, the lattice parameter of pulsed laser deposited La0.6Sr0.4Co1-xFexO3-δ thin films was monitored using in situ X-ray diffraction. We demonstrate that the chemical expansion under applied potential depends on the cathode morphology, which determines the contribution of different reaction pathways. We investigated applied potential dependent lattice expansion on La0.6Sr0.4Co1-xFexO3-δ with 3 different Co:Fe ratios in an attempt to connect bulk chemical expansion data to thin films. We find that the chemical expansion trends in thin films are different than expected from bulk data.
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