Abstract
Dark current (DC) limits the optical performance of CMOS image sensors. The main sources of the DC in a modern submicrometer process are the defects induced by the shallow trench isolation fabrication process steps. In this brief, we present a pixel layout technique to reduce the impact of these defects by removing the trench-oxide between the two adjacent edges of neighboring photodiodes (PDs). This isolation scheme relies only on the p-well layer and provides the further advantage of requiring less area. Hence, a larger PD can be designed, leading to an increased pixel fill factor. Experimental results show that this approach reduces the DC by 21% and increases the linear full well capacity by approximately 9%.
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