Abstract

ARROW-type optical waveguides are designed for implementation on silicon using the materials (silicon dioxide and silicon nitride) and techniques (CVD, RIE) of CMOS integrated-circuit technology. Light is detected by a photodiode buried in the silicon substrate, which is made following the same process. The steps of this process are described and their influence on the optical properties of the guides is analysed. The optical signal attenuation in the waveguide-photodiode coupling region and the cut-off frequency of the system are measured in test devices. The advantages of the technological compatibility with CMOS circuits are discussed.

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