Abstract
In this work we report the possibility to obtain a high refractive index grid anode directly on the substrate surface by fabricating a relatively large-area photonic crystal (PC) structure using the combinations of electron beam lithography (EBL) and focused ion beam (FIB) techniques. The performance of the realized photonic crystal (PC) structure were enhanced by milling the ITO layer until the glass substrate and by removing the further refractive index jump between the PC and the substrate. The good properties of highly conductive poly(3,4 ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS), ensured a continuous path for the current and a high refractive index jump for the PC structure by filling the holes in the PC structure.
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