Abstract
TiO 2 are applied widely as photocatalytic materials. In this study, we investigated preparation of TiO 2 thin film with photoinduced hydrophilicity under weak UV light in indoor environment. TiO 2 films were prepared by rf magnetron sputtering process in an atmosphere of pure oxygen. Ar ion beam irradiation treatment of TiO 2 film was carried out using a plasma cathode ion source. O–H absorption peaks as the wavenumber regions 3300–3400 cm −1 increased with increasing of Ar ion beam irradiation time. The improvement of photoinduced hydrophilicity of the film was independent of surface area of TiO 2 film. In XPS measurements, O 1s peaks of Ar ion beam irradiated TiO 2 films shifted 0.4–0.6 eV to higher binding energy side. Oxygen vacancies were induced in surface of the film by Ar ion beam irradiation. The TiO 2 films showed photoinduced hydrophilicity under weak UV light such as indoor environment.
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