Abstract
Phosphorus-containing surfactants of dodecylpoly(oxyethylene)phosphates and poly-(dodecyldecaoxyethylene)phosphates have been oxidatively mineralized by irradiated TiO 2 semiconductor particles. The disappearance of surface activity for the degraded surfactant solutions and the mineralization of surfactants to CO 2 and PO 3− 4 have been observed. In addition to the peroxide and aldehyde intermediates formed, formic acid is observed during the photodegradation process in this work. The possible mineralization mechanism is discussed.
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