Abstract
Metastable poly(phthalaldehyde) (PPHA) can be triggered to depolymerize under visible light by incorporation of photosensitive compounds, such as a photoacid generator (PAG), which can generate a strong acid in situ. However, photosensitive compounds can be thermally unstable and have limited shelf life, causing inadvertent device triggering. It can also be difficult to fabricate components that are photosensitive because special lighting conditions are needed. In this paper, nonphotosensitive PPHA films were formed and made photosensitive at the point of use. This improved the material shelf life and manufacturability by adding a second, PAG‐containing layer to the original nonphotosensitive layer at an optimal point before use. The catalytic photoacid was generated rapidly by exposure of the PAG‐containing layer to radiation. Depolymerization of PPHA via the acid catalyst was followed by diffusion of the acid into the nonphotosensitive layer causing it to depolymerize. Diffusion of the photoacid into the nonphotosensitive medium was quantified at various temperatures. Photoacid diffusion in a liquid, moving‐front caused depolymerization of the nonphotosensitive PPHA layer. The fabricated bilayer structure allowed for better stability of the structural material using PPHA while still achieving transience.
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