Abstract
The photo-crosslinking reaction of a polymeric photobase generator containing phthalimido carbamate (PC) groups was studied and applied to the formation of a negative type micropattern. The copolymer containing PC groups was prepared through the polymerization of methyl methacrylate and phthalimido methacryloxyethylcarbamate (PMC). The photochemical and cross-linking reaction of the copolymer film were studied using the UV and IR absorption spectral changes along with the normalized thickness measurements upon irradiation. The copolymer film was effectively cross-linked upon irradiation with 254nm UV light, and the cross-linking reaction progressed further with increasing irradiation dose and the amount of PMC units in the copolymer. The photochemical formation of the isocyanato groups was evidenced by comparing the IR absorption spectral changes of the exposed and masked copolymer film. The photo-crosslinking reaction of the copolymer was further studied by using a model compound. The results indicated that the cross-linking reaction occurred because of the formation of urea-type chemical bonds, which were produced through the reaction of the photochemically produced isocyanato and amino groups in the copolymer. A negative micropattern was obtained by using the photo-crosslinking reaction.
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