Abstract
The X-ray optical properties of diffraction gratings fabricated on the basis of a Si(400) crystal with a period of D = 1 μm are studied by triple-crystal X-ray diffractometry. The diffraction gratings are manufactured both by silicon profiling during the process of plasma chemical etching and by forming a phase-shift grating on the surface of a Si crystal. The principal difference in the diffraction properties of these gratings is demonstrated. The presence of an Au phase-shift grating is shown to lead to the formation of a two-dimensional diffraction pattern, whereas Si profiling leads to the formation of only a one-dimensional diffraction pattern.
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