Abstract
The patterning of indium tin oxide (ITO) films on flexible polyester (PET) substrates by using a self-assembled monolayer (SAM) of octadecyltrimethoxysilane (OTMS) was investigated. After a SAM is deposited on ITO films, the ITO surface hydrophilicity and electron transfer characteristics are altered. The contact angle and electrochemical cyclic voltammetry analyses indicate the optimal process to form a SAM on ITO films operated in a low-humidity environment at 25 ºC for 24 h. The AFM observation shows that the ITO films covered by a SAM can be protected during etching in an oxalic solution, which means a SAM can well play the role of a photoresist during lithographic process.
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