Abstract
Electrohydrodynamic (EHD) instability patterning exhibits substantial potential for application as a next-generation lithographic technique; nevertheless, its development continues to be hindered by the lack of process parameter controllability, especially when replicating sub-microscale pattern features. In this paper, a new parametric guide is introduced. It features an expanded range of valid parameters by increasing the pattern growth velocity, thereby facilitating reproducible EHD-driven patterning for perfect nanopattern replication. Compared with conventional EHD-driven patterning, the rapid patterning approach not only shortens the patterning time but also exhibits enhanced scalability for replicating small and geometrically diverse features. Numerical analyses and simulations are performed to elucidate the interplay between the pattern growth velocity, fidelity of the replicated features, and boundary between the domains of suitable and unsuitable parametric conditions in EHD-driven patterning. The developed rapid route facilitates nanopattern replication using EHD instability with a wide range of suitable parameters and further opens up many opportunities for device applications using tailor-made nanostructures in an effective and straightforward manner.
Highlights
Electrohydrodynamic (EHD) instability patterning exhibits substantial potential for application as a nextgeneration lithographic technique; its development continues to be hindered by the lack of process parameter controllability, especially when replicating sub-microscale pattern features
Numerical analyses and simulations are performed to elucidate the interplay between the pattern growth velocity, fidelity of the replicated features, and boundary between the domains of suitable and unsuitable parametric conditions in EHD-driven patterning
Various fabrication techniques have been extensively studied for decades,[1,2,3,4,5,6] aimed at producing nely structured surfaces for a wide range of applications, such as memory devices,[6,7] micro-/ nano uidic devices,[8,9] optical devices,[10] sensors,[11,12] and diverse functional coatings.[13,14]
Summary
Various fabrication techniques have been extensively studied for decades,[1,2,3,4,5,6] aimed at producing nely structured surfaces for a wide range of applications, such as memory devices,[6,7] micro-/ nano uidic devices,[8,9] optical devices,[10] sensors,[11,12] and diverse functional coatings.[13,14] Among them, instability of uidic thin lm can be regarded as a viable alternative to conventional topdown approaches, due to scalability, cost-effectiveness, and versatility.[15]. It features an expanded range of valid parameters by increasing the pattern growth velocity, thereby facilitating reproducible EHD-driven patterning for perfect nanopattern replication.
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