Abstract
Short‐wavelength ultraviolet (UV‐C) micro light‐emitting diode (Micro‐LED) array greatly benefits the optogenetic applications in neuroscience, optical communications, and maskless lithography. In this work, UV‐C Micro‐LED arrays with each pixel size of 10×10 μm2 were fabricated, and the nanorods introduced by inductively coupled plasma (ICP) etching were eliminated by post‐ICP tetramethylammonium hydroxide (TMAH) treatment. The pixel‐level electrical characteristics were analyzed, and the peak wavelength stability under variable injected current densities was demonstrated. The results indicated the potential of applying the TMAH treatment in the fabrication of the UV‐C Micro‐LED array.
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