Abstract
Fluorine‐doped tin oxide (FTO) films were deposited on float glass to create low‐emissivity glass (low‐E glass) by atmospheric pressure chemical vapor deposition (APCVD). Heat treatments were carried out to assess its antioxidant properties. The surface morphology, crystal structure, and the oxygen and tin concentrations in the FTO films were investigated by scanning electron microscope (SEM), X‐ray diffraction (XRD), Auger electron spectrometer (AES), and X‐ray photoelectron spectroscopy (XPS), respectively. The results indicated that the electrical properties determined by the four‐point probe method remained constant up to 600°C with increasing temperature. The FTO films exhibited nonstoichiometry with a ratio of [O]/[Sn] >2 on the top surface and <2 in the film. The sheet resistance of the film strongly depended on the oxygen concentration on the film surface. When the heating temperature reached 700°C, the sheet resistance increased rapidly from 9.4 to 86.7 Ω/□ with a concomitant increase in the oxygen concentration on the top surface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
