Abstract
Geometric gradients within ordered micro/nanostructures exhibit unique wetting properties. Well-defined and ordered microsphere arrays with geometric gradient (OMAGG) are successfully fabricated through combining colloidal lithography and inclined reactive ion etching (RIE). During the inclined RIE, the graded etching rates in vertical direction of etcher chamber are the key to generating a geometric gradient. The OMAGG can be used as an effective mask for the preparation of micro/nanostructure arrays with geometric gradient by selective RIE. Through this strategy, a well-defined wettability "library" with graded silicon cone arrays is fabricated, and the possibility of screening one desired "book" from the designated wettability "library" is demonstrated. Meanwhile, the silicon cone arrays with geometric gradient (SCAGG) can be applied to control the wetting behavior of water after being modified by hydrophilic or hydrophobic chemical groups. Based on this result, a temperature-responsive wetting substrate is fabricated by modifying poly n-isopropyl acrylamide (PNIPAM) on the SCAGG. These wettability gradients have great potential in tissue engineering, microfluidic devices, and integrated sensors.
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