Optimized morphology properties of silver catalyst substrate for twisted carbon nanoribbon growth by PECVD method

Abstract

A twisted carbon nanoribbon was deposited onto multicoated silver thin film using RF-PECVD method at relatively low radio frequency (rf) power, 8 watt. Plasma formation in the chamber is strongly influenced not only by rf power but also by methane flowrate hence in order to get optimum condition it need to be appropriated. At low rf power, deposited carbon atoms on catalyst substrate is obviously observed which is provides that even with a minimum power it still capable of resulted in carbon nanosheet but unable to enhance plasma formation therefore the properties of material absolutely need to be optimized. The fabrication process was carried out at 20 sccm of CH4 for 20 minutes with 70 MHz/8 watt and 300 mTorr pressure. From SEM images it shows that the morphology of silver catalyst substrates determine carbon formation. Even-times coating of silver film able to reduced holes surface and more smoothing textures therefore suitable enough for carbon nanosheet medium.