Abstract
By using a focused unit-order vortex beam generated by a spiral phase plate, it is possible to acquire ∼100 nm structures in direct-writing photolithography. This novel method is simple and inexpensive and can quickly fabricate nanometer-size dams or trenches that may have applications in nanoscale waveguides or micro- and nanofluidics. To overcome the defect of a small exposure dose tolerance in this method, which may lead to poor quality of the direct-writing lines, an alternative solution using a fractional-order vortex beam is proposed.
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