Abstract
ABSTRACTWe report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on silicon (100) n-type, quartz, sapphire, and corning glass substrates. We have studied the influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films. Dependence of nanocrystallites on temperature of substrate and ambient gas pressure is investigated. ZnO plasma created at varying fluence of KrF laser (248 nm) on the target was investigated using optical emission spectroscopy and 2-d images of the expanding plumes at various pressures of the ambient gas. X-ray diffraction, atomic force microscopy, electron probe micro-analyzer, and spectro-photometry were used to characterize as grown films.
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