Abstract
The theoretical foundation of the photoelastic methods being presently used for measuring and analyzing residual stresses in glass is insufficient for studying development of transient viscoelastic stress states in glass plates during tempering process and for an explanation of the actual material behavior. It is shown that the basic knowledge of photoviscoelastic effect in glass over a wide range of electromagnetic radiation and temperature is necessary for such on analysis. Some photoelastic properties of plate glass are presented.
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