Abstract
We have studied the effect of InN deposited over TiO2 nanoparticle (NP) films on the performance of dye-sensitized solar cells (DSSCs) using N3 dye with I-/I3- electrolyte. A 10–20% increase in efficiency was observed for InN deposited, N3 sensitized 5–8.5μm thick TiO2 films as compared to similar non-treated films. The deposition of InN was carried out in the temperature range of 573–723K organometallic chemical vapor deposition (OMCVD). Spectral shifts and DFT calculations with a model anchoring group (R′COOH) both suggest binding of the N3 dye directly to both InN and the InN/TiO2 sites.
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