Abstract
A low power, focused, argon ion laser beam ∼514.5 nm has been used to controllably and reproducibly deposit micron-size metallic films on transparent glass and quartz substrates. Film growth proceeds via the pyrolytic decomposition of organometallic molecules on nucleation sites. The nucleation sites can be created over the entire substrate by flood exposure with deep ultraviolet light in the presence of organometallic vapor or in micron size areas by forming an initial deposit and then scanning the substrate across the focused laser beam. The latter nucleation technique has been extended to the deposition of metal on chrome-on-glass photomasks. Here metal deposition proceeds in three distinct time periods: surface modification (fast), nucleation (slow), and film growth (fast). The visible-laser chemical vapor deposition technique has been used to demonstrate the repair of defects in photomasks with a resolution approaching 1 μm.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
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