Abstract
In this paper, we present two novel “quasi-Bayer” micro-polarizer (MP) patterns for the polarization imaging based on the division-of-focal-plane polarimeters (DoFP). Compared with the traditional equally-weighted MP pattern with four different micro-polarizers, the “quasi-Bayer” pattern requires less photo-lithography-based selective etching steps, leading to a significant reduction of the MP array's fabrication complexity. In addition, for the mainstream bilinear interpolation algorithm, the proposed “quasi-Bayer” pattern with three micro-polarizers exhibits the lowest mean square error (MSE) of 0.43%. Moreover, the “quasi-Bayer” patterns take advantages not only at the fixed illumination level, but also for different illumination levels. Reported experimental results validate the effectiveness of the “quasi-Bayer” patterns by varying the input light intensity from 13 lux to 213 lux.
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