Abstract
A novel diol based metalorganic route has been developed and employed to deposit BaTiO3 films on Si and Pt coated Si substrates. Differential thermal analysis, thermogravimetric analysis, x-ray photoelectron spectroscopy, and x-ray diffraction collectively indicated that BaTiO3 was formed through the reaction of Ba and Ti oxides at approximately 500 °C. The films were single phase, had no crystallographic texture, and contained no detectable impurities.
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