Novel hybrid TFET-FinFET 12T SRAM cells with enhanced write margin and read performance

Abstract

This work presents two innovative 12T cells combining tunnel field-effect transistor (TFET) and fin field-effect transistor (FinFET) technologies. These cells address reverse bias current issues by incorporating separate paths for reading data and write enhancement cut transistors, enhancing hold/read/write static noise margin (H/R/WSNM), reducing read time, and minimizing power consumption from TFET leakage. At 0.6 V, the first (second) SRAM cell shows a WSNM improvement over O_7T, 8T, CA_10T, 12T, and HF_10T cells by 152 % (93 %), 152 % (93 %), 157.7 % (97.5 %), 95 % (50 %), and 104 % (57 %), respectively. The leakage power of the first (second) 12T TFET SRAM cell is two (four) orders of magnitude lower than O_7T and 8T SRAM cells. These hybrid SRAM cells also exhibit faster read operations across VDD voltage levels (0.3 V–1 V) and the first 12T cell demonstrates shorter write access times than 12T and CA_10T SRAM cells. These characteristics make the proposed cells particularly suitable for energy-efficient IoT devices and medical applications, where balancing power, area, performance, and data integrity is critical.