Abstract
A universal non-invasive real-time frequency domain reflectometry plasma process measurement that is independent of impedance matching network is described. The measurement is deployed on the main power transmission line of the plasma tool to detect both hardware and reflections form plasma. An illustration for atmospheric pressure plasma and axial DC magnetron plasma is given. Power handling capability is 20 (2 A×10 V) and 100 W (250 mA×400 V), respectively. Four simple equivalent electrical models in terms of transmission-line theory and frequency dependent reflection modulus (gain) are employed to analyze the DC magnetron measurement results. It is shown that the electrical length between the directional device measurement plane and the plane at which the transmission line is termination by the hardware and plasma determines the frequency response signal. The strength of the signal (depth of the zero) is found to be inversely related to the termination resistance. Information on hardware, and dynamic process-induced changes due to physical sputtering/erosion are accessible.
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