Abstract
Non-conjugated cyclic dienes and maleic anhydride co-polymers were synthesized via co-polymerization which involves an addition cyclization process, and they were investigated an application to a photo resist base resin. Every these polymers, which have an alicyclic hydrocarbon main-chain, showed excellent transparency in the wavelength regions of deep UV rays, and some of these polymers have high reactive ion etch resistance as similar as phenolic base resin; i.e. polyvinyl-phenol. One of these polymers (EBH-MAH) was modified to a photo resist, which has diazo photo sensitive functional groups. This polymer appeared high sensitivity for exposure of the deep UV ray. Solubility rate of the polymer in an aqueous alkaline solution, which could be dissolved difficulty for the solution, increased excellently after deep UV exposure. Namely this polymer showed a function as a deep UV positive resist that could be developed in alkaline.
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