Abstract

Sputtered Ni and Ti layers were investigated as a diffusion barrier to substitute electroplated Ni between Ti–Si–C and Ti–Si–C–Ag nanocomposite coatings and Cu or CuSn substrates. Samples were subjected to thermal annealing studies by exposure to 400 °C for 11 h. Dense diffusion barrier and coating hindered Cu from diffusing to the surface. This condition was achieved for electroplated Ni in combination with magnetron-sputtered Ti–Si–C and Ti–Si–C–Ag layers deposited at 230 °C and 300 °C, and sputtered Ti or Ni layers in combination with Ti–Si–C–Ag deposited at 300 °C.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.