Abstract
A growing number of scientists and engineers around the world are using atomic force microscopy (AFM) [1] for an ever more diversified range of academic and industrial applications. Now three decades old, this popular nano-measurement technology is experiencing many advancements as users working in many fields seek AFM instrumentation that delivers data faster, affords more comprehensive experimental control, and is simpler to operate. The principle of AFM imaging is based on moving a sharp tip across a sample surface in a raster motion, while, in the case of contact mode imaging, the deflection is kept constant by retracting and approaching the tip using a feedback loop. Therefore, the tip is following the surface topography, and sample images are generated from this tip motion. Optimizing those feedback parameters is a major barrier for AFM beginners. Up to now it required considerable experience to get good images with high resolution and without artifacts.
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