Abstract
Nanoscale Light Sources for Optical Interconnects
Highlights
This editorial is aimed at addressing two key aspects of nanoscale light sources: (1) low-power optical communication and (2) crystallographic defect engineering for monolithic integration with silicon
Designing and prototyping light sources with sub light wavelength dimensions has been the topic of keen interest because of their versatility in optical communication
The minimum power required for a nano-LED light source should exceed the quantum shot noise limit (20 photons/bit) of a photodetector for optical communication to maintain a bit-error-rate of 10-9 [21]
Summary
This editorial is aimed at addressing two key aspects of nanoscale light sources: (1) low-power optical communication and (2) crystallographic defect engineering for monolithic integration with silicon. Metal cladded plasmonic lasers which have sub light wavelength foot print are capable of achieving high optical confinement, but these suffer from optical losses in the metal. For this reason plasmonic lasers operate at higher threshold currents than what is expected from a scaled optoelectronic device [18]. The most attractive option for a nano light source appears to be a nanoscale LED for two reasons: (1) improved Purcell factor resulting from the small cavity volume requirement [1,20] and (2) no threshold current requirement. The downside of nano-LEDs is their limited power output
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