Abstract
Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium, Ti[(CH3)2N]4, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of ∼10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.
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