Abstract
High-precision metrology has emerged as an enabling technology for modern key technologies. Therefore, at the Technische Universität Ilmenau, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200 mm × 200 mm × 25 mm, and a resolution of 0.02 nm was developed. The machine represents the great improvement of the extended three-dimensional Abbe comparator principle to achieve nanometre accuracy. All six degrees of freedom of the mirror plate with the measuring object are measured by fibre-coupled laser interferometers, the signals of which are then used together with the probe system signals for a high-precision position and orientation control and surface and coordinate measurements. This paper presents the metrological concept, the realized design as well as the metrological parameters.
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