Abstract
The morphology and microstructure of Ar +-ion bombarded (0001) α-Al 2O 3 surfaces were studied by employing analytical electron microscopy (AEM) and high-resolution transmission electron microscopy (HRTEM). Surface bombardment with 1 keV Ar +-ions resulted in the formation of a ca. 3-nm thick γ-Al 2O 3 layer with a high density of structural defects. A well-defined epitaxial orientation relationship between the γ-Al 2O 3 layer and the substrate was observed: (0001) α ∥(111) γ, [10 1 0] α ∥[110] γ, and [11 2 0] α ∥±[11 2 ]γ.
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