Abstract
We have investigated a dielectric–metal–dielectric (DMD) multilayer film, which is unique as compared with such conventional transparent conductive oxides as indium tin oxide (ITO). In this study, we have selected MoO3 and Ag as the dielectric material and metal, respectively, and employed a nano-mist method in addition to a vacuum evaporation one. The transmission spectra of the films indicated that the Ag morphology changed from isolated islands to continuous layers with increasing Ag layer thickness, and that the morphology change was enhanced by MoO3. Then, MoO3/Ag/MoO3 (MAM) multilayer-structured transparent electrodes could be fabricated by a nano-mist method as well as by a vacuum evaporation one. Comparative examination is made on the properties of MAM films fabricated by these two methods for their application.
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