Abstract

We have optimized the growth conditions of (Ga,Al)As/GaAs heterojunction bipolar phototransistors (HPT's) using MOCVD or MBE techniques. Devices with current-gains higher than 3000 and low input capacitances have been obtained using a fabrication process suitable for IC's. A photoreceiver has been designed with predicted performances of -39.5 dBm at 140 Mbits/s.

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