Abstract
Molecular Dynamics simulations are carried out for investigating atomic processes of platinum sputtering. Sputtered Pt atom energy distribution functions are determined at different sputtering argon ionenergies: 100, 500 and 1000 eV. Calculated energy distribution functions show a cross-over from Thompson theory to binary collision model when increasing argon ion energy and Pt atom sputtered energy. Implanted argon ion number is depending on its kinetic energy, while it is not the case in binary collision approximation. Finally sputtering yields are greater for Thompson theory than for binary collision model at low energy, but converge to the close values at high energy.
Highlights
Platinum in the form of dispersed nanoclusters is a well-known catalysts used in many applications [1] as fuel cells and chemical sensors, for example
Interactions between incoming ion and target atoms, and between target atoms are treated in the frame of binary collision approximation [12] which means essentially that these collisions are statistically independent, and so that many-body effects occurring during collision cascades are not treated
The Thompson model [19, 20], issued from collision cascade theory, is able to provide an empirical formula of the sputtered atom energy distribution function
Summary
Platinum in the form of dispersed nanoclusters is a well-known catalysts used in many applications [1] as fuel cells and chemical sensors, for example. A very popular simulation tool, able to determine sputtering yield, i.e., sputtered atom energy distribution function, is the SRIM software (version 2013 with 2008 stopping power parameters) [12, 13], which considers an amorphous target and ignores the interaction between trapped sputtering ions, and the effect of their accumulation in the target. Where E is the incoming sputtering ion energy, mg and ms are the masses of ion and target atom in a.m.u., respectively, and the numerical factor in units of Å−2.
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