Abstract
Thin interlayers are often used to improve adhesion between functional CVD coatings. It is also possible to modify the surface chemistry of a CVD layer so that the subsequent CVD layer is better adhered. This has been done in the case of Al 2O 3 and TiN by exposing the Al 2O 3 surface to a high concentration of NH 3 at high temperature for a limited time. A thermodynamic analysis shows the possibility for substituting N for O in the Al 2O 3 surface using this method. Scanning electron microscopy and Rutherford backscattering spectrometry (RBS) were used to analyze the interface chemistry. RBS was used to identify a depletion of oxygen in the near surface region of Al 2O 3 and the presence of TiN to a depth of 0.4 μm in the Al 2O 3 layer. Scratch testing with a diamond stylus was used to affirm the improved adhesion. The method is attractive because it simply involves exposing the surface to a controlled environment. CVD of a very thin uniform interlayer is more difficult.
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