Abstract

For single slabs of uniform material, such as bulk semiconductors, we derive closed-form expressions for absorption and reflection coefficients, α and R, respectively, in terms of measured reflectance and transmittance, Rm and Tm. The formula for α can replace the several commonly used approximations for α as a function of Tm and in particular does not require αd≫1, where d is the thickness. Thus, it can be applied to weak impurity absorptions, such as Fe absorption in Fe-doped GaN. Finally, the real (η) and imaginary (κ) parts of the index of refraction (n=η+iκ) can be obtained from α and R and agree well with η and κ results obtained from other experiments. For multilayer structures, “effective” values of α, R, η, and κ are obtained, but they can often be assigned to a particular layer. This technique has been successfully applied to many bulk and layered structures.

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