Abstract
The permanent film photoresist is a versatile material in the MEMS field. The formation technology of the minute tunnel structure with the permanent photoresist is watched with keen interest. The encasing of the semiconductor device with the minute tunnel structure to be used as a SAW (Surface Acoustic Wave) and BAW (Bulk Acoustic Wave) Filter, application as a ink jet head nozzle or micro channel for the semiconductor as a radiator are some of it potential applications.We have established a unique technology named Tenting by using a liquid resist and a dry film resist. This paper will present the Tenting method in detail.
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