Abstract
A serious problem in the use of chemical-vapour-deposited polycrystalline diamond coatings in electronics, optics as well as in cutting tools is the high surface roughness. In our work, microcrystalline and nanocrystalline diamond films with a thickness of 0.5–5μm were deposited using microwave chemical vapour deposition (MW CVD), and with a thickness of 1–4μm by hot filament chemical vapour deposition (HF CVD). For both deposition technologies, we investigated the effect of a negative bias upon the formation of microcrystalline and nanocrystalline diamond multilayers. In the cases of smooth Si and relief WC–Co substrate surfaces, the multilayers were found to have a “cauliflower” look. The structure and composition of deposited layers were checked by scanning electron microscopy and Raman spectroscopy.
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