Abstract

We report on single-mode C-band distributed feedback lasers fabricated through micro-transfer-printing of semiconductor optical amplifier coupons fabricated on a InP source wafer onto a silicon-on-insulator photonic circuit. The coupons are micro-transfer printed on quarter-wave shifted gratings defined in SiN deposited on the silicon waveguide. Alignment-tolerant adiabatic tapers are used to efficiently couple light from the hybrid III-V/Si waveguide to the Si waveguide circuit. 80 mA threshold current and a maximum single-sided waveguide-coupled output power above 6.9 mW is obtained at 20 °C. Single mode operation around 1558 nm with > 33 dB side mode suppression ratio is demonstrated. Micro-transfer printing-based heterogeneous integration is promising for the wafer-level integration of advanced laser sources on complex silicon photonic integrated circuit platforms without changing the foundry process flow.

Highlights

  • Photonic integrated circuits (PICs) are currently being utilized mostly in telecom and datacom markets [1]

  • We integrate distributed feedback (DFB) lasers on silicon photonic integrated circuits containing quarter-wave shifted gratings based on the micro-transfer-printing of III-V semiconductor optical amplifiers (SOAs) coupons fully processed on an InP source wafer

  • The design schematic and the longitudinal cross section are illustrated in Fig. 1.One of the major issues when micro-transfer-printing a processed SOA is the stringent alignment requirement between III-V and Si waveguide required for efficient coupling of light from the III-V to Si waveguide

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Summary

Introduction

Photonic integrated circuits (PICs) are currently being utilized mostly in telecom and datacom markets [1]. Several high-performance III-V-on-Si hybrid lasers with more than 10 mW output power and higher operating temperature of above 70 oC have been demonstrated with III-V die-to-wafer bonding [3,7] While this enables dense integration of efficient light sources and optical amplifiers, the SiPh back-end flow needs to be modified for the III-V integration [8,9,10]. This approach doesn’t allow dense integration of devices based on a different III-V epitaxial structure on the SiPh circuits, given the minimum die size of a few mm that can be handled and processed. We integrate distributed feedback (DFB) lasers on silicon photonic integrated circuits containing quarter-wave shifted gratings based on the micro-transfer-printing of III-V SOA coupons fully processed on an InP source wafer

Micro-transfer-printing technology
Design of the III-V-on-silicon distributed feedback laser
Processing of SOAs on InP substrate
Micro-transfer-printing process
Conclusion
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