Abstract
TiSiN/AlN nanomultilayers with different thicknesses of AlN layer were deposited on 304 stainless steel by magnetron sputtering system. X-ray diffraction, nanoindentation tester, atomic force microscopy, and friction wear tester were used to characterize microstructure and properties of TiSiN/AlN nanomultilayers. The results show that TiSiN/AlN nanomultilayers are face-centered cubic structures and exhibit a strong preferred orientation on (200) plane. The diffraction peaks of TiSIN/AlN nanomultilayer shift to a small angle. When the thickness of the AlN layer is 2 nm, the peak is highest, and the shift degree is biggest. The alternating tension and compression stress fields are formed along the growth direction of TiSiN/AlN nanomultilayers and increase the strength of the namomultilayers. When the thickness of the AlN layer is 2 nm, the maximum hardness and Young’s modulus of TiSiN/AlN nanomultilayers are, respectively, 32.8 GPa and 472 GPa, and the smallest roughness is 33.4 nm. But the friction coefficient is smallest when the thickness of the AlN layer is 1.5 nm.
Highlights
Advances in Materials Science and Engineering the Si content is 12%, the hardness and Young’s modulus of the NbN/CrSiN nanomultilayers are, respectively, as high as 31.92 GPa and 359.3 GPa [16]. e TiSiN/Ag nanomultilayers contain nc-TiN, nc-Ag crystal phase and Si3N4 amorphous phase with a hardness of 30.56 GPa, and Young’s modulus of 513 GPa, which can effectively prevent crack propagation and fracture resistance [17]. erefore the morphology of TiSiN in TiSiN nanomultilayers is controversial and needs further study
TiSiN/AlN nanomultilayers with different AlN layer thicknesses were prepared on 304 stainless steel using a vacuum multitarget magnetron sputtering system
TiSiN/AlN nanomultilayers are deposited on 304 stainless steel substrates using a JCP350M2 vacuum multitarget magnetron sputtering system
Summary
TiSiN/AlN nanomultilayers are deposited on 304 stainless steel substrates using a JCP350M2 vacuum multitarget magnetron sputtering system. E substrates are etched with argon for 15 min at bias voltage of − 700 V. e thicknesses of TiSiN layer and AlN layer are controlled by the alternate opening and closing of the TiSi target and the Al target shutters. E microstructure of TiSiN/AlN nanomultilayers is investigated using a Rigaku X-ray diffractometer with a copper target Cu-Kα. E hardness and Young’s modulus of TiSiN/AlN nanomultilayers are measured using a nanoindentation tester, with the load of 10 mN, the loading rate of 20 mN/min, the approach speed of 1000 nm/min, and the load holding time of 5 s. E experimental load is 80 g. e linear speed is 40 mm/s, and the running length is 5 mm. e test time is 5 min. e electronic balance with an accuracy of 0.0001 g used to measure the quality of the specimens before and after wear test
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